ASML delivers Intel's first High numerical Aperture Lithography equipment

Thanks to CTOnews.com netizens and soft media users for 1353584 clue delivery! CTOnews.com, December 22 (Xinhua)-- ASML recently tweeted through its official X (Twitter) account that it has delivered its first high numerical aperture lithography device to Intel.

CTOnews.com previously reported that the high numerical aperture lithography equipment developed by ASML is mainly used to produce 2nm process semiconductor chips, and the numerical aperture (NA) optical performance is improved from 0.33 to 0.55.

Intel has ordered six of ASML's planned production capacity of only 10 units next year, but ASML plans to increase its production capacity to 20 units a year in the next few years.

ASML's new high numerical aperture EUV system involves an entirely new tool for lenses with 0.55 numerical aperture and a resolution of 8 nanometers.

ASML did not officially say which model of lithography equipment was delivered to Intel, and unofficial sources said the Twinscan EXE:5000 prototype was delivered to Intel's research center in Oregon.

It is reported that this delivery uses 250 large cases of packaging, occupying a total of 13 containers, taking into account the delivery time and follow-up installation, it will take several months to really put into use.

In addition, Intel will use ASML's more advanced Twinscan EXE:5200 lithography equipment during mass production, at an estimated cost of 250 million euros, the report said.