Shulou(Shulou.com)12/24 Report--

Thanks to CTOnews.com netizens and soft media users for 1520111 clue delivery! CTOnews.com, December 19, SamMobile said that ASML will launch chip manufacturing equipment for 2nm process nodes in the next few months, increasing the numerical aperture (NA) optical performance from 0.33 to 0.55, while Samsung plans to start producing 2nm chips by the end of 2025.

Intel has ordered six of ASML's planned production capacity of only 10 units next year, but ASML plans to increase its production capacity to 20 units a year in the next few years.

At present, there are only two EUV lithography machines listed on the ASML website-NXE:3600D and NXE:3400C, both equipped with 0.33 NA reflective projection optics and 13.5nm EUV light source, which are suitable for the manufacture of 3/5nm and 5/7nm chips respectively.

A spokesman for ▲ NXE:3600DASML has revealed that EXE:5200 is the next-generation high-NA system of ASML, which has a higher lithography resolution and can reduce the chip by one-seventh and increase the density to 2.9 times.

According to previous reports on the ▲ ASML high NA system roadmap, ASML's first 0.55 NA EUV lithography machine is scheduled for mass production after 2025, and the first will be delivered to Intel.

Intel will be the first EXE:5200 buyer for ASML, an Intel spokesman said. Compared with EXE:5000, EXE:5200 is expected to bring several improvements, including higher productivity and so on.

According to Alan Priestley, an analyst at Gartner, the unit price of a 0.55 NA EUV lithography machine will double to $300 million (CTOnews.com Note: currently about 2.142 billion yuan).

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